发明授权
US08895427B2 Substrate having a transparent electrode and method for producing the same 有权
具有透明电极的基板及其制造方法

  • 专利标题: Substrate having a transparent electrode and method for producing the same
  • 专利标题(中): 具有透明电极的基板及其制造方法
  • 申请号: US13061943
    申请日: 2009-08-26
  • 公开(公告)号: US08895427B2
    公开(公告)日: 2014-11-25
  • 发明人: Takashi KuchiyamaKenji Yamamoto
  • 申请人: Takashi KuchiyamaKenji Yamamoto
  • 申请人地址: JP Osaka
  • 专利权人: Kaneka Corporation
  • 当前专利权人: Kaneka Corporation
  • 当前专利权人地址: JP Osaka
  • 代理机构: Alleman Hall McCoy Russell & Tuttle LLP
  • 优先权: JP2008-227184 20080904; JP2008-254123 20080930; JP2009-010318 20090120; JP2009-086022 20090331
  • 国际申请: PCT/JP2009/064863 WO 20090826
  • 国际公布: WO2010/026899 WO 20100311
  • 主分类号: H01L21/44
  • IPC分类号: H01L21/44
Substrate having a transparent electrode and method for producing the same
摘要:
A zinc oxide transparent electroconductive oxide has been difficult to use as a substrate having a transparent electrode because the oxide, when configured as a thin film, because of increased resistivity due to air and/or moisture exposure. Though doping can inhibit increase of resistance to some extent, there has been difficulty in selecting a type and an amount of a doping substance and because doping causes high initial resistance. A substrate having a transparent electrode with stable resistivity against various environments is produced by a magnetron sputtering method using a target composed of a zinc oxide transparent electroconductive oxide containing 0.50 to 2.75% silicon dioxide by weight relative to the oxide.
信息查询
0/0