发明授权
- 专利标题: Nonvolatile memory
- 专利标题(中): 非易失性存储器
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申请号: US13687737申请日: 2012-11-28
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公开(公告)号: US08890105B2公开(公告)日: 2014-11-18
- 发明人: Kiyohito Nishihara
- 申请人: Kiyohito Nishihara
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: H01L29/02
- IPC分类号: H01L29/02 ; H01L45/00 ; H01L27/24
摘要:
A nonvolatile memory according to an embodiment includes a first wiring line; a second wiring line arranged above the first wiring line and extending in a direction crossing the first wiring line; and a resistance change layer arranged in an intersection region of the first wiring line the second wiring line, the second wiring line including a first member extending in the direction in which the second wiring line extends, and an electrode layer containing a metal element arranged on a side surface of the first member along the direction in which the second wiring line extends, a lower surface of the electrode layer being in contact with an upper surface of the resistance change layer.
公开/授权文献
- US20140061565A1 NONVOLATILE MEMORY 公开/授权日:2014-03-06
信息查询
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