Invention Grant
- Patent Title: Circuitry component and method for forming the same
- Patent Title (中): 电路组件及其形成方法
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Application No.: US12545880Application Date: 2009-08-24
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Publication No.: US08884433B2Publication Date: 2014-11-11
- Inventor: Mou-Shiung Lin , Chien-Kang Chou , Ke-Hung Chen
- Applicant: Mou-Shiung Lin , Chien-Kang Chou , Ke-Hung Chen
- Applicant Address: US CA San Diego
- Assignee: Qualcomm Incorporated
- Current Assignee: Qualcomm Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Seyfarth Shaw LLP
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L23/532 ; H01L23/00 ; H01L23/31 ; H01L21/768 ; H01L23/522

Abstract:
A circuit structure includes a semiconductor substrate, first and second metallic posts over the semiconductor substrate, an insulating layer over the semiconductor substrate and covering the first and second metallic posts, first and second bumps over the first and second metallic posts or over the insulating layer. The first and second metallic posts have a height of between 20 and 300 microns, with the ratio of the maximum horizontal dimension thereof to the height thereof being less than 4. The distance between the center of the first bump and the center of the second bump is between 10 and 250 microns.
Public/Granted literature
- US20090309224A1 CIRCUITRY COMPONENT AND METHOD FOR FORMING THE SAME Public/Granted day:2009-12-17
Information query
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