Invention Grant
- Patent Title: System and method for ex situ analysis of a substrate
- Patent Title (中): 用于原位分析底物的系统和方法
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Application No.: US13626193Application Date: 2012-09-25
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Publication No.: US08884247B2Publication Date: 2014-11-11
- Inventor: Thomas G. Miller , Jason Arjavac , Damon Heer , Michael Strauss , Gerardus Nicolaas Anne van Veen
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; Ki O
- Main IPC: G01N1/28
- IPC: G01N1/28 ; H01J37/02 ; H01J37/305 ; H01J37/20 ; G01N1/32
Abstract:
A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.
Public/Granted literature
- US20140084157A1 System and Method for Ex Situ Analysis of a Substrate Public/Granted day:2014-03-27
Information query
