发明授权
- 专利标题： Surfaces having particles and related methods
- 专利标题（中）： 具有颗粒和相关方法的表面
-
申请号： US12601869申请日： 2008-05-29
-
公开(公告)号： US08852689B2公开(公告)日： 2014-10-07
- 发明人: Arjun Daniel Srinivas , Calvin Peng , Alexander Chow Mittal , Priyanka Agarwal
- 申请人： Arjun Daniel Srinivas , Calvin Peng , Alexander Chow Mittal , Priyanka Agarwal
- 申请人地址： US CA San Francisco
- 专利权人： Innova Dynamics, Inc.
- 当前专利权人： Innova Dynamics, Inc.
- 当前专利权人地址： US CA San Francisco
- 代理机构： Foley & Lardner LLP
- 代理商 Cliff Z. Liu
- 国际申请： PCT/US2008/065083 WO 20080529
- 国际公布： WO2008/150867 WO 20081211
- 主分类号： B05D3/10
- IPC分类号： B05D3/10 ; B29C59/02 ; C08J7/04 ; G01N33/48 ; A01N25/34 ; C08J7/02 ; A01N59/16 ; B05D7/02 ; B05D3/00
摘要：
Particles are embedded in a substrate by applying to at least a portion of the substrate a fluid and a population of particles, such that the substrate is softened to at least a degree that particles are at least partially embedded in the softened portion of the substrate. The softened portion of the substrate is hardened so as to securely embed the particles in the substrate.
公开/授权文献
- US20100230344A1 SURFACES HAVING PARTICLES AND RELATED METHODS 公开/授权日：2010-09-16
信息查询
