发明授权
US08811068B1 Integrated circuit devices and methods 有权
集成电路器件及方法

Integrated circuit devices and methods
摘要:
An integrated circuit can include SRAM cells, with pull-up transistors, pull-down transistors, and pass-gate transistors having a screening region positioned a distance below the gate and separated from the gate by a semiconductor layer. The screening region has a concentration of screening region dopants, the concentration of screening region dopants being higher than a concentration of dopants in the semiconductor layer. The screening region can provide an enhanced body coefficient for the pull-up transistors to increase a read static noise margin of the SRAM cell when a bias voltage is applied to the screening region. Related methods are also disclosed.
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