Invention Grant
- Patent Title: Method of manufacturing printhead including polymeric filter
- Patent Title (中): 打印头的制造方法包括聚合物过滤器
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Application No.: US12767828Application Date: 2010-04-27
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Publication No.: US08806751B2Publication Date: 2014-08-19
- Inventor: Yonglin Xie , John A. Lebens , Charles F. Faisst
- Applicant: Yonglin Xie , John A. Lebens , Charles F. Faisst
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent William R. Zimmerli
- Main IPC: B21D53/76
- IPC: B21D53/76 ; B23P17/00

Abstract:
A method of manufacturing a printhead includes providing a substrate and a filter membrane structure. A first portion of the substrate defines a plurality of nozzles and a second portion of the substrate defines a plurality of liquid chambers. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a respective one of the plurality of nozzles. The filter membrane structure is adhered, for example, laminated, to the second portion of the substrate. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a distinct portion of the filter membrane structure. Pores are formed in the filter membrane structure using a photo-lithography process.
Public/Granted literature
- US20110258851A1 METHOD OF MANUFACTURING PRINTHEAD INCLUDING POLYMERIC FILTER Public/Granted day:2011-10-27
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