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US08795928B2 Wave-shaped mask of fabricating nano-scaled structure 有权
制造纳米级结构的波形掩模

Wave-shaped mask of fabricating nano-scaled structure
Abstract:
A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
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