Invention Grant
- Patent Title: Wave-shaped mask of fabricating nano-scaled structure
- Patent Title (中): 制造纳米级结构的波形掩模
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Application No.: US13422921Application Date: 2012-03-16
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Publication No.: US08795928B2Publication Date: 2014-08-05
- Inventor: Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
- Applicant: Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
- Applicant Address: TW Taipei
- Assignee: National Taiwan University
- Current Assignee: National Taiwan University
- Current Assignee Address: TW Taipei
- Agency: Huffman Law Group, PC
- Priority: TW100132878A 20110913
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F1/50 ; G03F1/60

Abstract:
A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
Public/Granted literature
- US20130065161A1 WAVE-SHAPED MASK OF FABRICATING NANO-SCALED STRUCTURE Public/Granted day:2013-03-14
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