Invention Grant
- Patent Title: Method and system for in-situ monitoring of cathode erosion and predicting cathode lifetime
- Patent Title (中): 阴极侵蚀现场监测方法及系统，预测阴极寿命
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Application No.: US12912312Application Date: 2010-10-26
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Publication No.: US08756021B2Publication Date: 2014-06-17
- Inventor: Russell J. Low , Kevin M. Daniels , Bon-Woong Koo , Richard M. White , James W. Blanchette
- Applicant: Russell J. Low , Kevin M. Daniels , Bon-Woong Koo , Richard M. White , James W. Blanchette
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: G01B3/44
- IPC: G01B3/44
Abstract:
A method of controlling operation of an indirectly-heated cathode (IHC) ion source includes a step of measuring a rate of loss of cathode weight of the IHC ion source that occurs during operation using a first cathode configuration and under a first set of operation conditions. A maximum weight loss for the first cathode configuration is determined, and a cathode lifetime is calculated based upon the rate of cathode weight loss and the maximum weight loss. A further method includes receiving a minimum source bias power value for operation of a cathode in a first configuration, measuring a rate of decrease in source bias power for a cathode in the first configuration, and calculating a lifetime of the cathode based upon the minimum source bias power and rate of decrease in source bias power.
Public/Granted literature
- US20120101742A1 METHOD AND SYSTEM FOR IN-SITU MONITORING OF CATHODE ERSOSION AND PREDICTING CATHODE LIFETIME Public/Granted day:2012-04-26
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