发明授权
- 专利标题: Method and apparatus for hierarchical wafer quality predictive modeling
- 专利标题(中): 分层晶圆质量预测模型的方法和装置
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申请号: US13526152申请日: 2012-06-18
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公开(公告)号: US08732627B2公开(公告)日: 2014-05-20
- 发明人: Robert J. Baseman , Jingrui He , Yada Zhu
- 申请人: Robert J. Baseman , Jingrui He , Yada Zhu
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Otterstedt, Ellenbogen & Kammer, LLP
- 代理商 Daniel P. Morris, Esq.
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
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