发明授权
US08732627B2 Method and apparatus for hierarchical wafer quality predictive modeling 有权
分层晶圆质量预测模型的方法和装置

Method and apparatus for hierarchical wafer quality predictive modeling
摘要:
A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
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