Invention Grant
US08695110B2 Scanning probe microscope and sample observing method using the same
有权
扫描探针显微镜及使用其的样品观察方法
- Patent Title: Scanning probe microscope and sample observing method using the same
- Patent Title (中): 扫描探针显微镜及使用其的样品观察方法
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Application No.: US13586754Application Date: 2012-08-15
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Publication No.: US08695110B2Publication Date: 2014-04-08
- Inventor: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- Applicant: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-061201 20070312; JP2007-322722 20071214
- Main IPC: G01Q70/00
- IPC: G01Q70/00 ; G01Q70/16 ; G01N13/00

Abstract:
In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
Public/Granted literature
- US20130145507A1 SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME Public/Granted day:2013-06-06
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