发明授权
- 专利标题： Coating liquid for forming low dielectric constant amorphous silica-based coating film and the coating film obtained from the same
- 专利标题（中）： 用于形成低介电常数无定形二氧化硅基涂膜的涂布液和由其获得的涂膜
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申请号： US12086745申请日： 2006-12-15
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公开(公告)号： US08686101B2公开(公告)日： 2014-04-01
- 发明人: Miki Egami , Hiroki Arao , Akira Nakashima , Michio Komatsu
- 申请人： Miki Egami , Hiroki Arao , Akira Nakashima , Michio Komatsu
- 申请人地址： JP Kanagawa
- 专利权人： JGC Catalysts and Chemicals Ltd.
- 当前专利权人： JGC Catalysts and Chemicals Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理机构： Leydig, Voit & Mayer, Ltd.
- 优先权： JP2005-371017 20051222
- 国际申请： PCT/JP2006/325026 WO 20061215
- 国际公布： WO2007/072750 WO 20070628
- 主分类号： C08G77/08
- IPC分类号： C08G77/08
摘要：
A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA) and alkoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA), alkoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).
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