Invention Grant
- Patent Title: Patterned medium and method of manufacturing the same
- Patent Title (中): 图案化介质及其制造方法
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Application No.: US13424266Application Date: 2012-03-19
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Publication No.: US08681454B2Publication Date: 2014-03-25
- Inventor: Akira Kikitsu , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant: Akira Kikitsu , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2009-044002 20090226
- Main IPC: G11B5/82
- IPC: G11B5/82 ; G11B5/09

Abstract:
According to one embodiment, a method of manufacturing a patterned medium includes depositing a magnetic recording layer and applying an ultraviolet curable resin on both surfaces of a medium substrate, pressing a first resin stamper and a second resin stamper each including patterns of recesses and protrusions, corresponding to a patterned medium, against both surfaces of the medium substrate in such a manner that a direction from a center of the medium substrate toward a center of the first resin stamper is off-oriented from a direction from the center of the medium substrate toward a center of the second resin stamper to imprint the patterns of recesses and protrusions on the ultraviolet curable resin, and irradiating the ultraviolet curable resin with an ultraviolet ray through each of the first and second resin stampers to cure the ultraviolet curable resin.
Public/Granted literature
- US20120177948A1 PATTERNED MEDIUM AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-07-12
Information query
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