发明授权
- 专利标题： Germanium complexes with amidine derivative ligand and process for preparing the same
- 专利标题（中）： 锗配合物与脒衍生物配体及其制备方法
-
申请号： US13143621申请日： 2010-01-07
-
公开(公告)号： US08663736B2公开(公告)日： 2014-03-04
- 发明人: Jae Sun Jung , Su Hyong Yun , Minchan Kim , Sung Won Han , Yong Joo Park , Su Jung Shin , Ki Whan Sung , Sang Kyung Lee
- 申请人： Jae Sun Jung , Su Hyong Yun , Minchan Kim , Sung Won Han , Yong Joo Park , Su Jung Shin , Ki Whan Sung , Sang Kyung Lee
- 申请人地址： KR Chungcheongnam-do
- 专利权人： Soulbrain Sigma-Aldrich Ltd.
- 当前专利权人： Soulbrain Sigma-Aldrich Ltd.
- 当前专利权人地址： KR Chungcheongnam-do
- 代理机构： The Webb Law Firm
- 优先权： KR10-2009-0001645 20090108
- 国际申请： PCT/KR2010/000105 WO 20100107
- 国际公布： WO2010/079979 WO 20100715
- 主分类号： C23C16/18
- IPC分类号： C23C16/18 ; C07F7/30
摘要：
Provided is a germanium complex represented by Chemical Formula 1 wherein Y1 and Y2 are independently selected from R3, NR4R5 or OR6, and R1 through R6 independently represent (Ci-C7) alkyl. The provided germanium complex with an amidine derivative ligand is thermally stable, is highly volatile, and does not include halogen components. Therefore, it may be usefully used as a precursor to produce high-quality germanium thin film or germanium-containing compound thin film by metal organic chemical vapor deposition (MOCVD) or atomic layer deposition (ALD).
公开/授权文献
信息查询
IPC分类:
