发明授权
- 专利标题： System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope
- 专利标题（中）： 用于临界尺寸扫描电子显微镜的电磁干扰屏蔽系统和方法
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申请号： US13175384申请日： 2011-07-01
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公开(公告)号： US08633439B2公开(公告)日： 2014-01-21
- 发明人: Chia-Chi Tsao , Syun-Jie Jhan , Yi-Cheng Shih , Chwen Yu
- 申请人： Chia-Chi Tsao , Syun-Jie Jhan , Yi-Cheng Shih , Chwen Yu
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 代理机构： Haynes and Boone, LLP
- 主分类号： G01N23/00
- IPC分类号： G01N23/00 ; G21K7/00
摘要：
System and method for EMI shielding for a CD-SEM are described. One embodiment is a scanning electron microscope (“SEM”) comprising an electron gun for producing an electron beam directed toward a sample; a secondary electron (“SE”) detector for detecting secondary electrons reflected from the sample in response to the electron beam; and a dual-layer shield disposed around and enclosing the SE detector. The shield comprises a magnetic shielding lamina layer and a metallic foil layer.
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