Invention Grant
- Patent Title: Measuring and controlling parameters of a plasma generator
- Patent Title (中): 测量和控制等离子体发生器的参数
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Application No.: US12963209Application Date: 2010-12-08
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Publication No.: US08624501B2Publication Date: 2014-01-07
- Inventor: Siddharth P. Nagarkatti , Ali Shajii , Souheil Benzerrouk
- Applicant: Siddharth P. Nagarkatti , Ali Shajii , Souheil Benzerrouk
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Proskauer Rose LLP
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.
Public/Granted literature
- US20120146508A1 MEASURING AND CONTROLLING PARAMETERS OF A PLASMA GENERATOR Public/Granted day:2012-06-14
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