Invention Grant
- Patent Title: Nonvolatile semiconductor memory device and method of manufacturing the same
- Patent Title (中): 非易失性半导体存储器件及其制造方法
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Application No.: US12271434Application Date: 2008-11-14
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Publication No.: US08575589B2Publication Date: 2013-11-05
- Inventor: Hiroyuki Nagashima , Koichi Kubo , Hirofumi Inoue
- Applicant: Hiroyuki Nagashima , Koichi Kubo , Hirofumi Inoue
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak. McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-295962 20071114
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A nonvolatile semiconductor memory device includes a plurality of first lines; a plurality of second lines crossing the plurality of first lines; a plurality of memory cells each connected at an intersection of the first and second lines between both lines and including a variable resistor operative to store information in accordance with a variation in resistance; and a protection film covering the side of the variable resistor to suppress migration of cations at the side of the variable resistor.
Public/Granted literature
- US20090121208A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-05-14
Information query
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