发明授权
- 专利标题： Device having and method for forming fins with multiple widths
- 专利标题（中）： 具有用于形成多个宽度的翅片的装置和方法
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申请号： US13552296申请日： 2012-07-18
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公开(公告)号： US08569868B2公开(公告)日： 2013-10-29
- 发明人: Kangguo Cheng , Bruce B. Doris , Steven J. Holmes , Xuefeng Hua , Ying Zhang
- 申请人： Kangguo Cheng , Bruce B. Doris , Steven J. Holmes , Xuefeng Hua , Ying Zhang
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Tutunjian & Bitetto, P.C.
- 代理商 Louis Percello
- 主分类号： H01L29/06
- IPC分类号： H01L29/06
摘要：
A structure for a semiconductor device is disclosed. The structure includes a first feature and a second feature. The first feature and the second feature are formed simultaneously in a single etch process from a same monolithic substrate layer and are integrally and continuously connected to each other. The first feature has a width dimension of less than a minimum feature size achievable by lithography and the second feature has a width dimension of at least equal to a minimum feature size achievable by lithography.
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