发明授权
- 专利标题： Resist composition and method for producing resist pattern
- 专利标题（中）： 抗蚀剂组合物和抗蚀剂图案的制造方法
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申请号： US13404871申请日： 2012-02-24
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公开(公告)号： US08563219B2公开(公告)日： 2013-10-22
- 发明人: Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
- 申请人： Koji Ichikawa , Tatsuro Masuyama , Satoshi Yamaguchi
- 申请人地址： JP Tokyo
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2011-039450 20110225
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; G03F7/38 ; G03F7/039
摘要：
A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
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