Invention Grant
- Patent Title: Method of forming assist feature patterns
- Patent Title (中): 形成辅助特征图案的方法
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Application No.: US13180523Application Date: 2011-07-11
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Publication No.: US08524423B2Publication Date: 2013-09-03
- Inventor: Yi-Chih Chiang , Yuan-Chi Pai , Sho-Shen Lee , Yi-Ting Chen , Tuan-Yen Yu
- Applicant: Yi-Chih Chiang , Yuan-Chi Pai , Sho-Shen Lee , Yi-Ting Chen , Tuan-Yen Yu
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G03F1/36
- IPC: G03F1/36
Abstract:
A method of forming assist feature patterns includes providing an original layout pattern having at least a first region defined therein, the first region having a first light transmission rate larger than 0%; performing a search step to the original layout pattern to define at least a second region having a second light transmission rate equal to 0% in the original layout pattern; forming a plurality of assist features in the second region to increase the second light transmission rate to larger than 0%; and outputting the original layout pattern and the assist features to a reticle blank.
Public/Granted literature
- US20130017474A1 METHOD OF FORMING ASSIST FEATURE PATTERNS Public/Granted day:2013-01-17
Information query
