发明授权
US08492233B2 Configurable NP channel lateral drain extended MOS-based transistor
有权
可配置NP沟道横向漏极扩展MOS晶体管
- 专利标题: Configurable NP channel lateral drain extended MOS-based transistor
- 专利标题(中): 可配置NP沟道横向漏极扩展MOS晶体管
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申请号: US12883726申请日: 2010-09-16
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公开(公告)号: US08492233B2公开(公告)日: 2013-07-23
- 发明人: Marie Denison , Hannes Estl
- 申请人: Marie Denison , Hannes Estl
- 申请人地址: US TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: US TX Dallas
- 代理商 Warren L. Franz; Wade J. Brady, III; Frederick J. Telecky, Jr.
- 主分类号: H01L29/43
- IPC分类号: H01L29/43
摘要:
An integrated circuit containing a configurable dual n/p-channel 3-D resurf high voltage MOS field effect transistor (MOSFET) is disclosed. An n-channel drain is coterminous with a p-channel source in an n-well, and a p-channel drain is coterminous with an n-channel source in a p-well. A lateral drift region including n-type drift lanes and p-type drift lanes extends between the n and p wells. A resurf layer abuts the lateral drift region. The n-channel MOS gate is separate from the p-channel MOS gate. The p-channel MOS gate may be operated as a field plate in the n-channel mode, and vice versa. An n-channel MOS transistor may be integrated into the n-channel MOS source to provide an n-channel cascode transistor configuration, and similarly for a p-channel cascode configuration, to debias parasitic bipolar transistors under the MOS gates. Circuits using the MOSFET with various loads are also disclosed.
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