Invention Grant
- Patent Title: Nanostructure quick-switch memristor and method of manufacturing the same
- Patent Title (中): 纳米结构快开式忆阻器及其制造方法
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Application No.: US13129815Application Date: 2010-06-30
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Publication No.: US08487294B2Publication Date: 2013-07-16
- Inventor: Dianzhong Wen , Xiaohui Bai
- Applicant: Dianzhong Wen , Xiaohui Bai
- Applicant Address: CN Harbin, Heilongjiang
- Assignee: Heilongjiang University
- Current Assignee: Heilongjiang University
- Current Assignee Address: CN Harbin, Heilongjiang
- Priority: CN200910072447 20090702
- International Application: PCT/CN2010/074806 WO 20100630
- International Announcement: WO2011/000316 WO 20110106
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A nanostructure quick-switch memristor includes an upper electrode, a lower electrode and three layers of nanomembrane provided between the upper electrode and the lower electrode. The three layers of nanomembrane consist of an N-type semiconductor layer, a neutral semiconductor layer on the N-type semiconductor layer, and a P-type semiconductor layer on the neutral semiconductor layer. The nanostructure quick-switch memristor of the present invention has the quick switching speed, simple manufacturing method, and low manufacturing cost.
Public/Granted literature
- US20120091421A1 Nanostructure quick-switch memristor and method of manufacturing the same Public/Granted day:2012-04-19
Information query
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