Invention Grant
US08487294B2 Nanostructure quick-switch memristor and method of manufacturing the same 失效
纳米结构快开式忆阻器及其制造方法

  • Patent Title: Nanostructure quick-switch memristor and method of manufacturing the same
  • Patent Title (中): 纳米结构快开式忆阻器及其制造方法
  • Application No.: US13129815
    Application Date: 2010-06-30
  • Publication No.: US08487294B2
    Publication Date: 2013-07-16
  • Inventor: Dianzhong WenXiaohui Bai
  • Applicant: Dianzhong WenXiaohui Bai
  • Applicant Address: CN Harbin, Heilongjiang
  • Assignee: Heilongjiang University
  • Current Assignee: Heilongjiang University
  • Current Assignee Address: CN Harbin, Heilongjiang
  • Priority: CN200910072447 20090702
  • International Application: PCT/CN2010/074806 WO 20100630
  • International Announcement: WO2011/000316 WO 20110106
  • Main IPC: H01L45/00
  • IPC: H01L45/00
Nanostructure quick-switch memristor and method of manufacturing the same
Abstract:
A nanostructure quick-switch memristor includes an upper electrode, a lower electrode and three layers of nanomembrane provided between the upper electrode and the lower electrode. The three layers of nanomembrane consist of an N-type semiconductor layer, a neutral semiconductor layer on the N-type semiconductor layer, and a P-type semiconductor layer on the neutral semiconductor layer. The nanostructure quick-switch memristor of the present invention has the quick switching speed, simple manufacturing method, and low manufacturing cost.
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