发明授权
- 专利标题: Method for manufacturing semiconductor device
- 专利标题(中): 制造半导体器件的方法
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申请号: US12899993申请日: 2010-10-07
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公开(公告)号: US08470648B2公开(公告)日: 2013-06-25
- 发明人: Shunpei Yamazaki , Hideto Ohnuma , Tetsuya Kakehata
- 申请人: Shunpei Yamazaki , Hideto Ohnuma , Tetsuya Kakehata
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2007-218478 20070824
- 主分类号: H01L21/762
- IPC分类号: H01L21/762
摘要:
A semiconductor device including a plurality of field-effect transistors which are stacked with a planarization layer interposed therebetween over a substrate having an insulating surface, in which semiconductor layers in the plurality of field-effect transistors are separated from semiconductor substrates, and the semiconductor layers are bonded to an insulating layer formed over the substrate having an insulating surface or an insulating layer formed over the planarization layer.
公开/授权文献
- US20110027968A1 SEMICONDUCTOR DEVICE 公开/授权日:2011-02-03
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