发明授权
- 专利标题: Gate oxide breakdown-withstanding power switch structure
- 专利标题(中): 栅极氧化物击穿电源开关结构
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申请号: US13075682申请日: 2011-03-30
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公开(公告)号: US08385149B2公开(公告)日: 2013-02-26
- 发明人: Hao-I Yang , Ching-Te Chuang , Wei Hwang
- 申请人: Hao-I Yang , Ching-Te Chuang , Wei Hwang
- 申请人地址: TW Hsinchu
- 专利权人: National Chiao Tung University
- 当前专利权人: National Chiao Tung University
- 当前专利权人地址: TW Hsinchu
- 代理机构: Muncy, Geissler, Olds & Lowe, PLLC
- 优先权: TW99134465A 20101008
- 主分类号: G11C5/14
- IPC分类号: G11C5/14
摘要:
The present invention proposes a gate oxide breakdown-withstanding power switch structure, which is connected with an SRAM and comprises a first CMOS switch and a second CMOS switch respectively having different gate-oxide thicknesses or different threshold voltages. The CMOS switch, which has a normal gate-oxide thickness or a normal threshold voltage, provides current for the SRAM to wake up the SRAM from a standby or sleep mode to an active mode. The CMOS switch, which has a thicker gate-oxide thickness or a higher threshold voltage, provides current for the SRAM to work in an active mode. The present invention prevents a power switch from gate-oxide breakdown lest noise margin, stabilization and performance of SRAM be affected.
公开/授权文献
- US20120087196A1 GATE OXIDE BREAKDOWN-WITHSTANDING POWER SWITCH STRUCTURE 公开/授权日:2012-04-12
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