Invention Grant
- Patent Title: Magneto-resistance effect element, and method for manufacturing the same
- Patent Title (中): 磁阻效应元件及其制造方法
-
Application No.: US12073895Application Date: 2008-03-11
-
Publication No.: US08379351B2Publication Date: 2013-02-19
- Inventor: Yoshihiko Fuji , Hideaki Fukuzawa , Hiromi Yuasa , Kunliang Zhang , Min Li , Michiko Hara , Yoshinari Kurosaki
- Applicant: Yoshihiko Fuji , Hideaki Fukuzawa , Hiromi Yuasa , Kunliang Zhang , Min Li , Michiko Hara , Yoshinari Kurosaki
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,TDK Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,TDK Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Nixon & Vanderhye P.C.
- Priority: JPP2007-094474 20070330
- Main IPC: G11B5/39
- IPC: G11B5/39

Abstract:
An example magneto-resistance effect element includes a fixed magnetization layer of which a magnetization is substantially fixed in one direction; a free magnetization layer of which a magnetization is rotated in accordance with an external magnetic field and which is formed opposite to the fixed magnetization layer; and a spacer layer including a current confining layer with an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof and which is located between the fixed magnetization layer and the free magnetization layer. A thin film layer is located on a side opposite to the spacer layer relative to the free magnetization layer and a functional layer containing at least one element selected from the group consisting of Si, Mg, B, Al is formed in or on at least one of the fixed magnetization layer, the free magnetization layer and the thin film layer.
Public/Granted literature
- US20080239591A1 Magneto-resistance effect element, and method for manufacturing the same Public/Granted day:2008-10-02
Information query
IPC分类: