• Patent Title: Charged particle beam exposure system and beam manipulating arrangement
  • Application No.: US11988922
    Application Date: 2006-07-20
  • Publication No.: US08368030B2
    Publication Date: 2013-02-05
  • Inventor: Elmar PlatzgummerGerhard Stengl
  • Applicant: Elmar PlatzgummerGerhard Stengl
  • Applicant Address: DE Jena
  • Assignee: Carl Zeiss SMS GmbH
  • Current Assignee: Carl Zeiss SMS GmbH
  • Current Assignee Address: DE Jena
  • Agent Bruce D Riter
  • Priority: EP05015781 20050720
  • International Application: PCT/EP2006/007182 WO 20060720
  • International Announcement: WO2007/009804 WO 20070125
  • Main IPC: G21K5/04
  • IPC: G21K5/04
Charged particle beam exposure system and beam manipulating arrangement
Abstract:
A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
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