Invention Grant
- Patent Title: Charged particle beam exposure system and beam manipulating arrangement
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Application No.: US11988922Application Date: 2006-07-20
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Publication No.: US08368030B2Publication Date: 2013-02-05
- Inventor: Elmar Platzgummer , Gerhard Stengl
- Applicant: Elmar Platzgummer , Gerhard Stengl
- Applicant Address: DE Jena
- Assignee: Carl Zeiss SMS GmbH
- Current Assignee: Carl Zeiss SMS GmbH
- Current Assignee Address: DE Jena
- Agent Bruce D Riter
- Priority: EP05015781 20050720
- International Application: PCT/EP2006/007182 WO 20060720
- International Announcement: WO2007/009804 WO 20070125
- Main IPC: G21K5/04
- IPC: G21K5/04

Abstract:
A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
Public/Granted literature
- US20090140160A1 Charged particle beam exposure system and beam manipulating arrangement Public/Granted day:2009-06-04
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