发明授权
- 专利标题: Multiple select gates with non-volatile memory cells
- 专利标题(中): 具有非易失性存储单元的多个选择门
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申请号: US13164813申请日: 2011-06-21
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公开(公告)号: US08305810B2公开(公告)日: 2012-11-06
- 发明人: Seiichi Aritome
- 申请人: Seiichi Aritome
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Brooks, Cameron & Huebsch, PLLC
- 主分类号: G11C16/04
- IPC分类号: G11C16/04
摘要:
Multiple select gates in association with non-volatile memory cells are described. Various embodiments include multiple select gate structure, process, and operation and their applicability for memory devices, modules, and systems. In one embodiment a memory array is described. The memory array includes a number of select gates coupled in series to a number of non-volatile memory cells. A first select gate includes a control gate and a floating gate electrically connected together and a second select gate includes a control gate and a floating gate which are electrically separated by a dielectric layer.
公开/授权文献
- US20110249494A1 MULTIPLE SELECT GATES WITH NON-VOLATILE MEMORY CELLS 公开/授权日:2011-10-13
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