发明授权
US08283257B2 Systems and methods for oscillating exposure of a semiconductor workpiece to multiple chemistries
有权
用于将半导体工件振荡暴露于多个化学物质的系统和方法
- 专利标题： Systems and methods for oscillating exposure of a semiconductor workpiece to multiple chemistries
- 专利标题（中）： 用于将半导体工件振荡暴露于多个化学物质的系统和方法
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申请号： US11766632申请日： 2007-06-21
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公开(公告)号： US08283257B2公开(公告)日： 2012-10-09
- 发明人: Michael Andreas
- 申请人： Michael Andreas
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 代理机构： Perkins Coie LLP
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; H01L21/461 ; C03C15/00 ; C03C25/68
摘要：
Systems and methods for oscillating exposure of a semiconductor workpiece to multiple chemistries are disclosed. A method in accordance with one embodiment includes sequentially exposing a portion of a semiconductor workpiece surface to a first chemistry having a first chemical composition and a second chemistry having a second chemical composition different than the first. Prior to rinsing the portion of the workpiece surface, the portion is sequentially exposed to the first and second chemistries again. The first and second chemistries are removed from the portion, and, after sequentially exposing the portion to each of the first and second chemistries at least twice, and removing the first and second chemistries, the portion is rinsed and dried.
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