发明授权
US08262915B2 Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus
有权
从液体,液体供给装置和浸渍曝光装置中除去微气泡和/或颗粒的方法
- 专利标题: Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus
- 专利标题(中): 从液体,液体供给装置和浸渍曝光装置中除去微气泡和/或颗粒的方法
-
申请号: US13087400申请日: 2011-04-15
-
公开(公告)号: US08262915B2公开(公告)日: 2012-09-11
- 发明人: Chin-Sheng Yang , Wen-Sheng Chien
- 申请人: Chin-Sheng Yang , Wen-Sheng Chien
- 申请人地址: TW Science-Based Industrial Park, Hsin-Chu
- 专利权人: United Microelectronics Corp.
- 当前专利权人: United Microelectronics Corp.
- 当前专利权人地址: TW Science-Based Industrial Park, Hsin-Chu
- 代理商 Winston Hsu; Scott Margo
- 主分类号: C02F1/30
- IPC分类号: C02F1/30 ; G21K5/00
摘要:
A liquid supply apparatus capable of removing micro-bubbles and particles is described, including a pipe, a laser provider and at least one micro-bubble/particle outlet. The laser provider provides a laser crossing the pipe, wherein the laser is provided in a manner such that a micro-bubble/particle blocking/repelling barrier is formed crossing the pipe blocking or repelling micro-bubbles, particles or both in the liquid in the pipe. The micro-bubble/particle outlet is disposed on the pipe between the barrier and the liquid inlet of the pipe, adjacent to the barrier for discharging micro-bubbles, particles or both.
公开/授权文献
信息查询