发明授权
US08262915B2 Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus 有权
从液体,液体供给装置和浸渍曝光装置中除去微气泡和/或颗粒的方法

  • 专利标题: Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus
  • 专利标题(中): 从液体,液体供给装置和浸渍曝光装置中除去微气泡和/或颗粒的方法
  • 申请号: US13087400
    申请日: 2011-04-15
  • 公开(公告)号: US08262915B2
    公开(公告)日: 2012-09-11
  • 发明人: Chin-Sheng YangWen-Sheng Chien
  • 申请人: Chin-Sheng YangWen-Sheng Chien
  • 申请人地址: TW Science-Based Industrial Park, Hsin-Chu
  • 专利权人: United Microelectronics Corp.
  • 当前专利权人: United Microelectronics Corp.
  • 当前专利权人地址: TW Science-Based Industrial Park, Hsin-Chu
  • 代理商 Winston Hsu; Scott Margo
  • 主分类号: C02F1/30
  • IPC分类号: C02F1/30 G21K5/00
Method for removing micro-bubbles and/or particles from liquid, liquid supply apparatus and immersion exposure apparatus
摘要:
A liquid supply apparatus capable of removing micro-bubbles and particles is described, including a pipe, a laser provider and at least one micro-bubble/particle outlet. The laser provider provides a laser crossing the pipe, wherein the laser is provided in a manner such that a micro-bubble/particle blocking/repelling barrier is formed crossing the pipe blocking or repelling micro-bubbles, particles or both in the liquid in the pipe. The micro-bubble/particle outlet is disposed on the pipe between the barrier and the liquid inlet of the pipe, adjacent to the barrier for discharging micro-bubbles, particles or both.
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