发明授权
US08242545B2 Device for detection of a gas or gas mixture and method for manufacturing such a device
有权
用于检测气体或气体混合物的装置及其制造方法
- 专利标题: Device for detection of a gas or gas mixture and method for manufacturing such a device
- 专利标题(中): 用于检测气体或气体混合物的装置及其制造方法
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申请号: US12765339申请日: 2010-04-22
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公开(公告)号: US08242545B2公开(公告)日: 2012-08-14
- 发明人: Christoph Wilbertz , Heinz-Peter Frerichs , Ingo Freund
- 申请人: Christoph Wilbertz , Heinz-Peter Frerichs , Ingo Freund
- 申请人地址: DE Freiburg i. Br.
- 专利权人: Micronas GmbH
- 当前专利权人: Micronas GmbH
- 当前专利权人地址: DE Freiburg i. Br.
- 代理机构: Muncy, Geissler, Olds & Lowe, PLLC
- 优先权: DE102009018364 20090423
- 主分类号: G01N27/403
- IPC分类号: G01N27/403
摘要:
A device for detecting a gas or gas mixture has a first and a second gas sensor. The first gas sensor is a MOSFET, which comprises a first source, a first drain, a first channel zone disposed between the latter elements, and a first gas sensitive layer capacitively coupled to the first channel zone that contains palladium and reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensor has, in a semiconductor substrate, a second source, a second drain, and a second channel zone between the latter elements, which is capacitively coupled via an air gap to a suspended gate. The latter comprises a second gas sensitive layer that reacts to a change in the concentration of the gas to be detected with a change in its work function. The second gas sensitive layer is arranged on a support layer and faces the air gap. The support layer is formed by another semiconductor substrate, and the first gas sensor is integrated in the front side of the second semiconductor substrate facing away from the air gap.
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