Invention Grant
US08211612B2 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
有权
含氟聚合物涂料组合物，使用涂料组合物形成含氟聚合物膜的方法，以及形成光致抗蚀剂或光刻图案的方法
- Patent Title: Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
- Patent Title (中): 含氟聚合物涂料组合物，使用涂料组合物形成含氟聚合物膜的方法，以及形成光致抗蚀剂或光刻图案的方法
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Application No.: US11591548Application Date: 2006-11-02
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Publication No.: US08211612B2Publication Date: 2012-07-03
- Inventor: Kazuhiko Maeda , Mitsutaka Otani , Haruhiko Komoriya , Takeo Komata , Shinya Akiba
- Applicant: Kazuhiko Maeda , Mitsutaka Otani , Haruhiko Komoriya , Takeo Komata , Shinya Akiba
- Applicant Address: JP Yamaguchi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Yamaguchi
- Agency: Young & Thompson
- Priority: JP2005-321599 20051104
- Main IPC: G03C1/00
- IPC: G03C1/00 ; G03C7/00 ; G03F1/00 ; G03F7/00 ; C07D307/00 ; C07D317/00 ; C07D323/02
Abstract:
A method for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound in a solvent comprising a fluorinated acetal having a specific structure is applied on a photoresist and dried to form a protective film. A fluorinated acetal having the specific structure is suitable as a solvent for being brought into contact with a fluorine-containing polymer film, peeling the film, and forming a photoresist or a lithographic pattern.
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