发明授权
- 专利标题: Method for producing an integrated device
- 专利标题(中): 集成装置的制造方法
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申请号: US12275276申请日: 2008-11-21
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公开(公告)号: US08201325B2公开(公告)日: 2012-06-19
- 发明人: Laurent A. Dellmann , Michel Despont , Ute Drechsler , Roland M. Guerre
- 申请人: Laurent A. Dellmann , Michel Despont , Ute Drechsler , Roland M. Guerre
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Vazken Alexanian
- 优先权: EP07121352 20071122
- 主分类号: H05K3/30
- IPC分类号: H05K3/30
摘要:
A method for producing an integrated device. A source substrate is provided, the source substrate carrying one or more components to be attached to a receiver surface having a uneven topography. The source substrate includes a deformable layer on a surface on which the one or more components are carried. The source substrate is aligned such that said one or more components carried thereon are associated with contact areas of the receiver surface. The source substrate and the receiver surface are moved towards each other such that the one or more components are brought into contact with the contact areas wherein the deformable layer is at least partially deformed. The source substrate is removed such that the one or more of the components remain located on the contact areas of the receiver surface.
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