发明授权
US08198649B2 Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compound semiconductor device using the same
有权
在金属层上生长的化合物半导体衬底,其制造方法以及使用其的化合物半导体器件
- 专利标题: Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compound semiconductor device using the same
- 专利标题(中): 在金属层上生长的化合物半导体衬底,其制造方法以及使用其的化合物半导体器件
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申请号: US11982716申请日: 2007-11-02
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公开(公告)号: US08198649B2公开(公告)日: 2012-06-12
- 发明人: Yong-Jin Kim , Doo-Soo Kim , Ho-Jun Lee , Dong-Kun Lee
- 申请人: Yong-Jin Kim , Doo-Soo Kim , Ho-Jun Lee , Dong-Kun Lee
- 申请人地址: KR Gumi
- 专利权人: Siltron, Inc.
- 当前专利权人: Siltron, Inc.
- 当前专利权人地址: KR Gumi
- 代理机构: Greer, Burns & Crain, Ltd.
- 优先权: KR10-2006-0109308 20061107
- 主分类号: H01L33/20
- IPC分类号: H01L33/20
摘要:
The present invention relates to a compound semiconductor substrate and a method for manufacturing the same. The present invention provides the manufacturing method which coats spherical balls on a substrate, forms a metal layer between the spherical balls, removes the spherical balls to form openings, and grows a compound semiconductor layer from the openings. According to the present invention, the manufacturing method can be simplified and grow a high quality compound semiconductor layer rapidly, simply and inexpensively, as compared with a conventional ELO (Epitaxial Lateral Overgrowth) method or a method for forming a compound semiconductor layer on a metal layer. And, the metal layer serves as one electrode of a light emitting device and a light reflecting film to provide a light emitting device having reduced power consumption and high light emitting efficiency.
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