发明授权
- 专利标题： Exposure apparatus and method for producing device
- 专利标题（中）： 曝光装置及其制造方法
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申请号： US11767425申请日： 2007-06-22
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公开(公告)号： US08174668B2公开(公告)日： 2012-05-08
- 发明人: Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
- 申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2003-146423 20030523; JP2003-305280 20030828; JP2004-049231 20040225
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
公开/授权文献
- US07995187B2 Exposure apparatus and method for producing device 公开/授权日：2011-08-09
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