发明授权
- 专利标题: Heterostructure device and associated method
- 专利标题(中): 异质结构装置及相关方法
-
申请号: US11961532申请日: 2007-12-20
-
公开(公告)号: US08159002B2公开(公告)日: 2012-04-17
- 发明人: Vinayak Tilak , Alexei Vertiatchikh , Kevin Sean Matocha , Peter Micah Sandvik , Siddharth Rajan
- 申请人: Vinayak Tilak , Alexei Vertiatchikh , Kevin Sean Matocha , Peter Micah Sandvik , Siddharth Rajan
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: Ziolkowski Patent Solutions Group, SC
- 代理商 Jean K. Testa
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A heterostructure device includes a semiconductor multi-layer structure that has a first region, a second region and a third region. The first region is coupled to a source electrode and the second region is coupled to a drain electrode. The third region is disposed between the first region and the second region. The third region provides a switchable electrically conductive pathway from the source electrode to the drain electrode. The third region includes iodine ions. A system includes a heterostructure field effect transistor that includes the device.
公开/授权文献
- US20090159929A1 HETEROSTRUCTURE DEVICE AND ASSOCIATED METHOD 公开/授权日:2009-06-25
信息查询
IPC分类: