Invention Grant
- Patent Title: Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus
- Patent Title (中): 放置基板的方法，转印基板的方法，支撑系统和光刻投影装置
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Application No.: US12784763Application Date: 2010-05-21
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Publication No.: US08154709B2Publication Date: 2012-04-10
- Inventor: Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen , Marco Adrianus Peter Van Den Heuvel
- Applicant: Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen , Marco Adrianus Peter Van Den Heuvel
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstien & Fox P.L.L.C.
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62
Abstract:
A method of placing a substrate onto a surface of a substrate holder, in which the surface is provided with a plurality of burls. Substrate placement data for allowing placement of the substrate at a certain position with respect to a position of the plurality of burls on the surface of the substrate holder is calculated. The substrate is placed at the certain position in accordance with the substrate placement data. The certain position may be based on the position at which placement would result in a minimized overlay error or may be based on the position at which placement would result in minimized substrate deformation.
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