发明授权
US08153471B2 Method for forming a reduced active area in a phase change memory structure
有权
在相变存储器结构中形成减小的有效面积的方法
- 专利标题: Method for forming a reduced active area in a phase change memory structure
- 专利标题(中): 在相变存储器结构中形成减小的有效面积的方法
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申请号: US12945860申请日: 2010-11-14
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公开(公告)号: US08153471B2公开(公告)日: 2012-04-10
- 发明人: Li-Shyue Lai , Chao-Hsiung Wang , Denny Tang , Wen-Chin Lin
- 申请人: Li-Shyue Lai , Chao-Hsiung Wang , Denny Tang , Wen-Chin Lin
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Tung & Associates
- 主分类号: H01L21/06
- IPC分类号: H01L21/06
摘要:
A phase change memory structure and method for forming the same, the method including providing a substrate comprising a conductive area; forming a spacer having a partially exposed sidewall region at an upper portion of the spacer defining a phase change memory element contact area; and, wherein the spacer bottom portion partially overlaps the conductive area. Both these two methods can reduce active area of a phase change memory element, therefore, reducing a required phase changing electrical current.
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