发明授权
- 专利标题： Mask applied to a workpiece
- 专利标题（中）： 掩模应用于工件
-
申请号： US12689605申请日： 2010-01-19
-
公开(公告)号： US08153466B2公开(公告)日： 2012-04-10
- 发明人: Russell J. Low , Julian G. Blake , Frank Sinclair
- 申请人： Russell J. Low , Julian G. Blake , Frank Sinclair
- 申请人地址： US MA Gloucester
- 专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址： US MA Gloucester
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method of fabricating a workpiece is disclosed. A material defining apertures is applied to a workpiece. A species is introduced to the workpiece through the apertures and the material is removed. For example, the material may be evaporated, may form a volatile product with a gas, or may dissolve when exposed to a solvent. The species may be introduced using, for example, ion implantation or gaseous diffusion.
公开/授权文献
- US20100184243A1 MASK APPLIED TO A WORKPIECE 公开/授权日：2010-07-22
信息查询
IPC分类:
