发明授权
- 专利标题： Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus
- 专利标题（中）： 放置基板的方法，转印基板的方法，支撑系统和光刻投影装置
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申请号： US12248586申请日： 2008-10-09
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公开(公告)号： US08149387B2公开(公告)日： 2012-04-03
- 发明人: Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen , Abraham Alexander Soethoudt
- 申请人： Jozef Augustinus Maria Alberti , Gerardus Petrus Matthijs Van Nunen , Frans Erik Groensmit , Rene Theodorus Petrus Compen , Abraham Alexander Soethoudt
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/62
摘要：
A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of the plurality of burls on the surface of the substrate holder. Then, the substrate is placed at the certain position in accordance with the substrate placement data. The certain position may be based on the position at which placement would result in a minimized overlay error or may be based on the position at which placement would result in minimized substrate deformation.
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