Invention Grant
- Patent Title: Field effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US13021118Application Date: 2011-02-04
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Publication No.: US08148752B2Publication Date: 2012-04-03
- Inventor: Ayanori Ikoshi , Shingo Hashizume , Masahiro Hikita , Hiroto Yamagiwa , Manabu Yanagihara
- Applicant: Ayanori Ikoshi , Shingo Hashizume , Masahiro Hikita , Hiroto Yamagiwa , Manabu Yanagihara
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-045440 20100302
- Main IPC: H01L29/778
- IPC: H01L29/778

Abstract:
A field effect transistor includes a semiconductor stack formed on a substrate, and having a first nitride semiconductor layer and a second nitride semiconductor layer. A source electrode and a drain electrode are formed on the semiconductor stack so as to be separated from each other. A gate electrode is formed between the source electrode and the drain electrode so as to be separated from the source electrode and the drain electrode. A hole injection portion is formed near the drain electrode. The hole injection portion has a p-type third nitride semiconductor layer, and a hole injection electrode formed on the third nitride semiconductor layer. The hole injection electrode and the drain electrode have substantially the same potential.
Public/Granted literature
- US20110215379A1 FIELD EFFECT TRANSISTOR Public/Granted day:2011-09-08
Information query
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