Invention Grant
- Patent Title: Electron beam apparatus
- Patent Title (中): 电子束装置
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Application No.: US12813064Application Date: 2010-06-10
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Publication No.: US08148684B2Publication Date: 2012-04-03
- Inventor: Mitsutoshi Yoshikawa
- Applicant: Mitsutoshi Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2009-161532 20090708
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K5/00

Abstract:
An electron beam apparatus has the electron optical column for releasing an electron beam from the front-end portion after the beam is emitted from an electron beam source located on a rear-end portion of the column, a specimen chamber connected to a front-end portion of the column, and an aperture member withdrawably disposed in the front-end portion of the column within the specimen chamber. The apparatus further includes a rotating mechanism for rotating the aperture member along a given plane lying along the direction of a path of the beam. Thus, the aperture member can be attached and detached to and from the front-end portion of the column.
Public/Granted literature
- US20110006209A1 Electron Beam Apparatus Public/Granted day:2011-01-13
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