Invention Grant
- Patent Title: Charged particle beam apparatus and method adjusting axis of aperture
- Patent Title (中): 带电粒子束装置和方法调节孔径
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Application No.: US12310149Application Date: 2007-08-03
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Publication No.: US08124932B2Publication Date: 2012-02-28
- Inventor: Takashi Ogawa , Yo Yamamoto , Hiroshi Matsumura
- Applicant: Takashi Ogawa , Yo Yamamoto , Hiroshi Matsumura
- Applicant Address: JP
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2006-226867 20060823
- International Application: PCT/JP2007/065237 WO 20070803
- International Announcement: WO2008/023559 WO 20080228
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
A charged particle beam apparatus includes a charged particle source, an aperture, an object lens, an observing unit, an aperture driving portion, and a control portion. The control portion includes a spot pattern forming portion that forms a plurality of spot patterns on a surface of a sample by irradiating a charged particle beam, an analyzing portion that calculates a position of a spot center of the spot pattern and a geometrical center position of a halo, and an adjusting position determining portion that calculates an adjusting position based on a position of intersecting lines connecting the positions of the spot centers of the respective spot patterns and the center position of the halo. In this manner, the position of the aperture can be easily and accurately adjusted in a short period of time by moving the center axis of the aperture to the adjusting position.
Public/Granted literature
- US20090242757A1 CHARGED PARTICLE BEAM APPARATUS AND METHOD ADJUSTING AXIS OF APERTURE Public/Granted day:2009-10-01
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