Invention Grant
- Patent Title: Photopolymer composition usable for lithographic plates
- Patent Title (中): 可用于平版印刷版的光聚合物组合物
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Application No.: US12159287Application Date: 2007-01-02
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Publication No.: US08119331B2Publication Date: 2012-02-21
- Inventor: Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
- Applicant: Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
- Applicant Address: DE Stuttgart
- Assignee: Kodak Graphic Communications GmbH
- Current Assignee: Kodak Graphic Communications GmbH
- Current Assignee Address: DE Stuttgart
- Agent J. Lanny Tucker
- Priority: DE102006000783 20060104
- International Application: PCT/EP2007/000009 WO 20070102
- International Announcement: WO2007/077207 WO 20070712
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/30 ; G03F7/004

Abstract:
Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.
Public/Granted literature
- US20090011363A1 Photopolymer Composition Usable for Lithographic Plates Public/Granted day:2009-01-08
Information query
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