发明授权
US08118897B2 Mix head assembly for forming chemical mechanical polishing pads 有权
混合头组件用于形成化学机械抛光垫

Mix head assembly for forming chemical mechanical polishing pads
摘要:
A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
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