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US08115276B2 Integrated circuit system employing back end of line via techniques 有权
集成电路系统采用后端线技术

Integrated circuit system employing back end of line via techniques
Abstract:
An integrated circuit system that includes: providing a substrate including front-end-of-line circuitry; forming a first metallization layer over the substrate and electrically connected to the substrate; forming a viabar or a via group over the first metallization layer; and forming a second metallization layer over the first metallization layer and electrically connected to the first metallization layer through either the viabar or the via group.
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