发明授权
US08068709B2 Transmission gratings designed by computed interference between simulated optical signals and fabricated by reduction lithography 有权
通过模拟光信号之间的计算干涉设计并通过还原光刻制造的透射光栅

Transmission gratings designed by computed interference between simulated optical signals and fabricated by reduction lithography
摘要:
A method comprises computing an interference pattern between a simulated design input optical signal and a simulated design output optical signal, and computationally deriving an arrangement of at least one diffractive element set from the computed interference pattern. The interference pattern is computed in a transmission grating region, with the input and output optical signals each propagating through the transmission grating region as substantially unconfined optical beams. The arrangement of diffractive element set is computationally derived so that when the diffractive element set thus arranged is formed in or on a transmission grating, each diffractive element set would route, between corresponding input and output optical ports, a corresponding diffracted portion of an input optical signal incident on and transmitted by the transmission grating. The method can further comprise forming the set of diffractive elements in or on the transmission grating according to the derived arrangement.
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