Invention Grant
US08064244B2 Thin seeded Co/Ni multilayer film with perpendicular anisotropy for spintronic device applications
有权
用于自旋电子器件应用的具有垂直各向异性的薄种子Co / Ni多层膜
- Patent Title: Thin seeded Co/Ni multilayer film with perpendicular anisotropy for spintronic device applications
- Patent Title (中): 用于自旋电子器件应用的具有垂直各向异性的薄种子Co / Ni多层膜
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Application No.: US12456621Application Date: 2009-06-19
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Publication No.: US08064244B2Publication Date: 2011-11-22
- Inventor: Kunliang Zhang , Min Li , Yuchen Zhou , Soichi Oikawa , Kenichiro Yamada , Katsuhiko Koui
- Applicant: Kunliang Zhang , Min Li , Yuchen Zhou , Soichi Oikawa , Kenichiro Yamada , Katsuhiko Koui
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TDK Corporation,Kabushiki Kaisha Toshiba
- Current Assignee: TDK Corporation,Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A spin valve structure for a spintronic device is disclosed and includes a composite seed layer made of at least Ta and a metal layer having a fcc(111) or hcp(001) texture to enhance perpendicular magnetic anisotropy (PMA) in an overlying (Co/Ni)x multilayer. The (Co/Ni)x multilayer is deposited by a low power and high Ar pressure process to avoid damaging Co/Ni interfaces and thereby preserving PMA. As a result, only a thin seed layer is required. PMA is maintained even after annealing at 220° C. for 10 hours. Examples of GMR and TMR spin valves are described and may be incorporated in spin transfer oscillators and spin transfer MRAMs. The free layer is preferably made of a FeCo alloy including at least one of Al, Ge, Si, Ga, B, C, Se, Sn, or a Heusler alloy, or a half Heusler alloy to provide high spin polarization and a low magnetic damping coefficient.
Public/Granted literature
- US20090257151A1 Thin seeded Co/Ni multilayer film with perpendicular anisotropy for spintronic device applications Public/Granted day:2009-10-15
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