Invention Grant
US08045595B2 Self aligned diode fabrication method and self aligned laser diode
有权
自对准二极管制造方法和自对准激光二极管
- Patent Title: Self aligned diode fabrication method and self aligned laser diode
- Patent Title (中): 自对准二极管制造方法和自对准激光二极管
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Application No.: US11600618Application Date: 2006-11-15
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Publication No.: US08045595B2Publication Date: 2011-10-25
- Inventor: Yong Ma
- Applicant: Yong Ma
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Koppel, Patrick, Heybl & Philpott
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A method for fabricating a laser diode comprising providing a laser diode epitaxial structure and depositing a metal layer stack on the epitaxial structure, the stack comprising a contact and sacrificial layer. A ridge is formed in the laser diode epitaxial structure, the stack being the mask forming the ridge. An insulating layer is deposited over the ridge and at least a portion of the sacrificial layer is removed. At least a portion of the insulating thin film at the top of the stack is also removed. A pad metal is deposited in electrical contact with the contact and is insulated from the ridge and laser diode epitaxial structures by the insulating layer.
Public/Granted literature
- US20080112454A1 Self aligned diode fabrication method and self aligned laser diode Public/Granted day:2008-05-15
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