Invention Grant
US08045595B2 Self aligned diode fabrication method and self aligned laser diode 有权
自对准二极管制造方法和自对准激光二极管

  • Patent Title: Self aligned diode fabrication method and self aligned laser diode
  • Patent Title (中): 自对准二极管制造方法和自对准激光二极管
  • Application No.: US11600618
    Application Date: 2006-11-15
  • Publication No.: US08045595B2
    Publication Date: 2011-10-25
  • Inventor: Yong Ma
  • Applicant: Yong Ma
  • Applicant Address: US NC Durham
  • Assignee: Cree, Inc.
  • Current Assignee: Cree, Inc.
  • Current Assignee Address: US NC Durham
  • Agency: Koppel, Patrick, Heybl & Philpott
  • Main IPC: H01S5/00
  • IPC: H01S5/00
Self aligned diode fabrication method and self aligned laser diode
Abstract:
A method for fabricating a laser diode comprising providing a laser diode epitaxial structure and depositing a metal layer stack on the epitaxial structure, the stack comprising a contact and sacrificial layer. A ridge is formed in the laser diode epitaxial structure, the stack being the mask forming the ridge. An insulating layer is deposited over the ridge and at least a portion of the sacrificial layer is removed. At least a portion of the insulating thin film at the top of the stack is also removed. A pad metal is deposited in electrical contact with the contact and is insulated from the ridge and laser diode epitaxial structures by the insulating layer.
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