Invention Grant
US08018678B1 Method for simultaneous electronic lapping guide (ELG) and perpendicular magnetic recording (PMR) pole formation
有权
同时电子研磨导轨（ELG）和垂直磁记录（PMR）极点形成方法
- Patent Title: Method for simultaneous electronic lapping guide (ELG) and perpendicular magnetic recording (PMR) pole formation
- Patent Title (中): 同时电子研磨导轨（ELG）和垂直磁记录（PMR）极点形成方法
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Application No.: US12324442Application Date: 2008-11-26
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Publication No.: US08018678B1Publication Date: 2011-09-13
- Inventor: Jinqiu Zhang , Tsung Yuan Chen , Steven C. Rudy
- Applicant: Jinqiu Zhang , Tsung Yuan Chen , Steven C. Rudy
- Applicant Address: US CA Fremont
- Assignee: Western Digital (Fremont), LLC
- Current Assignee: Western Digital (Fremont), LLC
- Current Assignee Address: US CA Fremont
- Main IPC: G11B5/147
- IPC: G11B5/147
Abstract:
A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing a stop layer; providing an insulating layer over the stop layer; forming a pole trench in the insulating layer by performing a reactive ion etching (RIE) process in the insulating layer over the stop layer; forming an electronic lapping guide (ELG) in the insulating layer by performing the RIE process in the insulating layer over the stop layer; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.
Information query
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