发明授权
- 专利标题: Optical system and method for use in projection systems
- 专利标题(中): 用于投影系统的光学系统和方法
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申请号: US10575565申请日: 2004-10-17
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公开(公告)号: US08009358B2公开(公告)日: 2011-08-30
- 发明人: Zeev Zalevsky , Yuval Kapellner , Izhar Eyal , Golan Manor
- 申请人: Zeev Zalevsky , Yuval Kapellner , Izhar Eyal , Golan Manor
- 申请人地址: IL Hertzliya
- 专利权人: Explay Ltd.
- 当前专利权人: Explay Ltd.
- 当前专利权人地址: IL Hertzliya
- 代理机构: Browdy and Neimark, PLLC
- 国际申请: PCT/IL2004/000951 WO 20041017
- 国际公布: WO2005/036211 WO 20050421
- 主分类号: G02B27/10
- IPC分类号: G02B27/10
摘要:
An optical system and method are presented to produce a desired illuminating light pattern. The system comprises a light source system configured and operable to produce structured light in the form of a plurality of spatially separated light beams; and a beam shaping arrangement. The beam shaping arrangement is configured as a diffractive optical unit configured and operable to carry out at least one of the following: (i) combining an array of the spatially separated light beams into a single light beam thereby significantly increasing intensity of the illuminating light; (ii) affecting intensity profile of the light beam to provide the illuminating light of a substantially rectangular uniform intensity profile.
公开/授权文献
- US20070273957A1 Optical System and Method for Use in Projection Systems 公开/授权日:2007-11-29
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